专利名称：Measurement system with thickness
calculation and method of operation thereof
发明人：Biao Liu,Chikuang Wang,Yuri Uritsky申请号：US13714368申请日：20121213公开号：US08569692B1公开日：20131029
专利附图：
摘要：A method of operation of a measurement system includes: providing aspecimen having a film; controlling a beam generator to direct a charged particle beaminto the specimen; detecting a reference signal emitted from the specimen; normalizing
the reference signal to create a film L-ratio; and determining a thickness of the film bycorrelating the film L-ratio to a calibration curve.
申请人：Applied Materials, Inc.
地址：Santa Clara CA US
国籍：US
代理机构：Ishimaru & Associates LLP
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