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Structure and operation of high voltage supports

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专利名称:Structure and operation of high voltage

supports

发明人:Christopher J. Spindt,David L.

Morris,Theodore S. Fahlen,Anthony P.Schmid,Paul A. Lovoi

申请号:US08/505841申请日:19950720公开号:US05614781A公开日:19970325

摘要:According to the invention, a flat panel device includes a spacer for providinginternal support. In one embodiment, the spacer is made of ceramic, glass-ceramic,ceramic reinforced glass, devitrified glass, metal with electrically insulative coating orhigh-temperature vacuum- compatible polyimide, and can be a spacer wall, a spacerstructure including a plurality of holes, or some combination of a spacer wall, spacerwalls, and spacer structure. Spacer surfaces are treated to reduce secondary emissionsand prevent charging of the spacer surfaces. The flat panel device can include a

thermionic cathode or a field emitter cathode, and the faceplate and backplate can bothbe straight or both be curved. The flat panel device can include an addressing grid.

申请人:CANDESCENT TECHNOLOGIES CORPORATION

代理机构:Skjerven, Morrill, MacPherson, Franklin & Friel

代理人:Ronald J. Meetin,E. Eric Hoffman

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