专利名称：Exposure apparatus, gas replacement
method, semiconductor device
manufacturing method, semiconductormanufacturing factory and exposureapparatus maintenance method
发明人：Shinichi Hara,Yutaka Tanaka,Kazuyuki
Kasumi,Toru Hirabayashi
申请号：US09818625申请日：20010328
公开号：US20010035942A1公开日：20011101
摘要：An exposure apparatus includes a chamber which incorporates an opticalelement and surrounds a predetermined region, a closed vessel which surrounds thechamber, and a pump for reducing the internal pressure of the chamber. The pressure ofthe closed vessel is also reduced when the internal pressure of the chamber is reduced.
申请人：HARA SHINICHI,TANAKA YUTAKA,KASUMI KAZUYUKI,HIRABAYASHI TORU
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